Improving The Surface Properties Of Medical Titanium Implants By Deposited Organosilicon HMDSO

Abstract

Organosilicon Thin films (plasma polymerized hexamethyldisiloxane)           (pp-HMDSO) were deposited on substrate surfaces of medical Titanium implants using plasma enhanced chemical vapor deposition (PECVD), and was studied the effect of these films on each of Corrosion resistance to these implants in the middle of a script of a solution of 0.9% NaCl, and the values of the composed micro-hardness. With the aim of analyzing the morphological analysis of these films by Atomic Force Microscope (AFM) the films were deposited on silicon substrates, and to measure the thickness of these films they were deposited on a Quartz Crystal MicroBalance (QCM), within the same specified conditions for the settings themselves. Electrochemical tests were conducted using Tafel polarization technique to study film's corrosion resistance, and micro-hardness test was also performed on these substrates and reference samples, after immersion of the substrates (which were deposited with above mentioned thin films) for ten days in abrasive media. The results showed promising properties to protect from corrosion of the organosilicon (pp-HMDSO) thin films deposited on medical Tanium implant surface, in addition to increase the micro-hardness values.